Vertically structured group iii nitride semiconductor led chip and method for manufacturing the same

ABSTRACT

A method for manufacturing vertically structured Group III nitride semiconductor LED chips includes a step of forming a light emitting laminate on a growth substrate; a step of forming a plurality of separate light emitting structures by partially removing the light emitting laminate to partially expose the growth substrate; a step of forming a conductive support on the plurality of light emitting structures; a step of lifting off the growth substrate from the plurality of light emitting structures; and a step of cutting the conductive support thereby singulating a plurality of LED chips each having the light emitting structure. The step of partially removing the light emitting laminate is performed such that each of the plurality of light emitting structures has a top view shape of a circle or a 4n-gon en” is a positive integer) having rounded corners.

TECHNICAL FIELD

The present invention relates to a vertically structured LED chip inwhich Group III nitride semiconductor layers are stacked, and a methodfor manufacturing the same.

RELATED ART

In general, Group III-V semiconductors made of compounds of Group IIIelements and Group V elements are widely used for devices such as lightemitting diodes (LEDs).

In manufacturing LEDs of a Group III-V semiconductor such as GaP, GaAs,AlGaAs, or AlInGaP, using Al, Ga, or In as a Group III element and usingP or As as a Group V element, the semiconductor is grown on a singlecrystal substrate made of similar material to the semiconductor for thesake of lattice matching. For example, in cases of epitaxially growingAlGaAs, a GaAs substrate is typically used because AlGaAs is almostlattice matched to GaAs over the entire Al composition range.

In bulk single crystal growth of GaP or GaAs, impurities are added forconductivity control to industrially produce high quality, largediameter (diameter of 2 inches or more), low-cost n-type or p-typeconductivity single crystal substrates. A vertical structure can beemployed in which the conductive substrate and a light emitting laminateformed by stacking the Group III-V semiconductor layers are sandwichedbetween a pair of electrodes, and electric current flows in the verticaldirection.

On the other hand, a Group III nitride semiconductor using Al, Ga, In,etc. as a Group III element and using N as a Group V element has a highmelting point and high nitrogen dissociation pressure, which makes itdifficult to perform bulk single crystal growth. Further, since thereare no inexpensive large diameter conductive single crystal substratesavailable, such a semiconductor is typically formed on a sapphiresubstrate.

However, a sapphire substrate is electrically insulating; accordingly,electric current does not flow in the substrate. Therefore, a lateralstructure in which electric current flows in a lateral direction hasbeen conventionally employed. This structure is obtained by partiallyremoving a light emitting laminate formed by sequentially growing ann-type Group III nitride semiconductor layer, an active layer (lightemitting layer), and a p-type Group III nitride semiconductor layer on asapphire substrate to expose the n-type Group III nitride semiconductorlayer, and providing an n-type electrode and a p-type electrode on theexposed n-type Group III nitride semiconductor layer and the p-typeGroup III nitride semiconductor layer, respectively.

In this case, there are four problems as follows. Since the active layeris partially removed, (1) the area of a light emitting portion isreduced. Electric current is necessarily flown in a lateral direction inthe n-type thin layer having a thickness of up to about 5 μm, so thatseries resistance is high to cause (2) increase in the drive voltage and(3) increase in heat generation. Further, since the sapphire substratehas low thermal conductivity, heat generated in the light emittingstructure is not sufficiently dissipated, which (4) causes a heatsaturation problem in LED characteristics, and is disadvantageous inachieving high output.

In response to this, in recent years, the following techniques forobtaining vertically structured LED chips have been actively studied anddeveloped. After forming a light emitting laminate on a sapphiresubstrate, the light emitting laminate is supported by a conductivesupport, and then a sapphire substrate is separated by lift-off. Theconductive support and the light emitting laminate are sandwichedbetween a pair of electrodes.

Patent Document 1 (JP 2006-303429A) discloses a technique for making avertically structured. LED chip having its top view shape of a polygonhaving five or more angles or a circle thereby improving the effect ofextracting light through a side surface of the LED chip to preventdeterioration in characteristics of the LED chip due to heat generationand to increase its life.

However, the technique disclosed in Patent Document 1 is considered tolimit the effect of extracting light through a side surface to the caseof small chip size. In other words, since a light emitting structurelayer is typically 5 μm to 10 μm at most, when the chip size is large,the area ratio of the side surface to the entire surface of the lightemitting structure is low, and the rate of the light extraction from thechip through the side surface is reduced accordingly.

As an example, not as a vertical structure but as a lateral structure,Example 1 of Patent Document 2 (JP 2002-76435A) describes that when alight emitting structure is processed into a circular cylinder having aradius of 60 μm to 140 μm, the extraction efficiency of light through aside surface tends to be improved thereby increasing the light output asthe radius of the circular cylinder, namely, the curvature radius issmaller. This specifically applies only to chips having a small sizesuch as 350 μm or less, and however contradicts in case of the higheroutput due to increased chip size.

Further, in the technique disclosed in Patent Document 1, a lightemitting structure is a light emitting laminate formed from a Group IIInitride semiconductor or such a laminate on which a reflective ohmiccontact layer is formed allover. Support portions corresponding toindividual LED chips are formed of a metal layer by plating; part of thelight emitting structure exposed between the chips is removed by dryetching using the metal plate as a mask; and then a sapphire growthsubstrate is removed by laser lift-off.

If the sapphire substrate is removed with the support portions and thelight emitting structures being separated, chips would fall apart;accordingly, subsequent processes such as the manufacturing of an n-typeelectrode would be complicated and the yield would be reduced.

Support portions of LED chips need to have a thickness of generally 50μm to about 150 μm for the convenience of handling in post-processes,for example, a mounting process. So, the dimensional accuracy andensuring the shape of a metal support layer formed by plating aredifficult. And, etching of the light emitting structure using the metalsupport layer formed by plating as a mask makes it difficult to achievedimensional accuracy and ensuring the shape. Furthermore, since thereflective ohmic metal (ohmic contact layer) is also etched using themask, metal residue would attach to a side surface of the light emittinglaminate; thus, LED chip characteristics would be adversely affected bya short circuit, leakage current, or the like.

PRIOR ART DOCUMENT Patent Document

-   [Patent Document 1] JP2006-303429 A-   [Patent Document 2] JP2002-76435 A

DISCLOSURE OF THE INVENTION Problems to be Solved by the Invention

In order to manufacture a nitride semiconductor chip having a verticalstructure such as an LED, a laser lift-off process in which an epitaxiallayer is separated from a sapphire substrate by laser as describedabove, a chemical lift-off process in which a metal buffer layer or thelike is etched to separate an epitaxial layer from a sapphire substrate,or a photochemical lift-off process is used. Any of the processes is amethod for lifting off an epitaxial layer, in which a layer of amaterial which allows epitaxial growth of a nitride semiconductor isformed on a growth substrate, and after the growth of the nitridesemiconductor, the layer is dissolved by laser thermal decomposition oretching to lift-off the epitaxial layer from the growth substrate. Thiscan be described in other words as “the growth substrate is lifted offfrom the epitaxial layer”.

FIGS. 1( a) to 1(c) are diagrams for illustrating vertically structuredLED chips of a Group III nitride semiconductor which are obtained bylift-off. FIG. 1( a) is a schematic side view of one of singulated LEDchips. FIG. 1( b) is a schematic plan view of one of singulated LEDchips. FIG. 1( c) is a schematic plan view of a wafer on which aplurality of light emitting structures are formed before singulationinto separate LED chips.

As shown in FIG. 1( a), a vertically structured LED chip 200 includes aconductive support portion 202, a light emitting structure 201, and anupper electrode 203 in this order. In general, the conductive supportportion 202 and the light emitting structure 201 are formed to have atetragonal top view shape as shown in FIG. 1( b). This is because whenthe top view shape of the light emitting structures 201 are tetragon asshown in FIG. 1( c), in cutting a wafer with a plurality of lightemitting structures 201 formed thereon into separate LED chips 200, thecutting may be performed rectilinearly in two perpendicular directionsas shown by dashed lines in the diagram. Thus, high process productivityis achieved and material loss due to kerf loss can be reduced. Note thatin this case, the conductive support portion also serves as a lowerelectrode.

The present inventors performed a primary isolation by grooving a lightemitting laminate made of a Group III nitride semiconductor on asapphire substrate with a grid pattern by dry etching up to the sapphiresubstrate, as to form a plurality of separate light emitting structures.Next, a conductive support having the shape of a substrate was formed,and then lift-off was performed to separate the sapphire substrate. Eachof the light emitting structures after the lift-off is integrallysupported by the conductive support. The separate light emittingstructures after the lift-off were found to have considerable rate ofcracks formed. The cracks seem to form when the light emittingstructures supported by the conductive support are detached from thesapphire substrate in the lift-off.

FIG. 2 is a top view of the formed cracks observed using an opticalmicroscope. Crack bands are shown to propagate from the vicinity of thecorners to the center portion. (This is Conventional example to be shownhereafter in Table 1, and the incidence of cracks was 95.5%.) Theproduct with cracks is deemed to be a defective product, which involvesserious problems in terms of yield, cost, and productivity.

The formation of such cracks has not been disclosed in publiclyavailable patent documents, professional literature, or the like partlybecause it is in the course of study and development. However, it is acritical issue to be solved for achieving mass production of verticalstructured Group III nitride semiconductor LED chips.

An object of the present invention is to solve the above problems and toprovide high-quality vertical LED chips without cracks in its lightemitting structure, and a method for manufacturing the same.

Means for Solving the Problem

In order to achieve the above object, the present invention primarilyincludes the following components.

(1) A method for manufacturing vertically structured Group III nitridesemiconductor LED chips, comprising: a light emitting laminate formationstep of forming a light emitting laminate by sequentially stacking afirst conductivity type Group III nitride semiconductor layer, a lightemitting layer, and a second conductivity type Group III nitridesemiconductor layer on a growth substrate, the second conductivity typebeing different from the first conductivity type; a light emittingstructure formation step of forming a plurality of separate lightemitting structures by partially removing the light emitting laminate topartially expose the growth substrate; a step of forming an ohmicelectrode layer and a connection layer on the plurality of lightemitting structures; a step of forming a conductive support which alsoserves as a lower electrode on the connection layer; a separation stepof lifting off the growth substrate from the plurality of light emittingstructures; and a cutting step of cutting the conductive support betweenthe light emitting structures thereby singulating a plurality of LEDchips each having the light emitting structure supported by a conductivesupport portion. The light emitting structure formation step includes astep of partially removing the light emitting laminate such that each ofthe plurality of light emitting structures has a top view shape of acircle or a 4n-gon (“n” is a positive integer) having rounded corners.

(2) The method for manufacturing vertically structured Group HI nitridesemiconductor LED chips according to (1) above, wherein a plurality ofthrough grooves or through holes penetrating the conductive support areprovided in a portion of the conductive support located between thelight emitting structures.

(3) The method for manufacturing vertically structured Group III nitridesemiconductor LED chips according to (2) above, wherein the cutting stepis performed along through the plurality of through grooves or throughholes.

(4) The method for manufacturing vertically structured Group III nitridesemiconductor LED chips according to (1) or (2) above, wherein theseparation step is performed by chemical lift-off or photochemicallift-off.

(5) The method for manufacturing vertically structured Group III nitridesemiconductor LED chips according to any one of (1) to (3) above,wherein the separation step is performed by laser lift-off.

(6) The method for manufacturing vertically structured Group III nitridesemiconductor LED chips according to any one of (1) to (5) above,wherein the step of forming the conductive support is performed by abonding method, a wet film formation method, or a dry film formationmethod.

(7) A vertically structured Group III nitride semiconductor LED chipmanufactured by the method according to any one of (1) to (6) above,wherein at least one of a plurality of side surfaces of the conductivesupport portion is part of a wall of the through groove or the throughhole.

(8) A vertically structured Group III nitride semiconductor LED chipcomprising: a conductive support portion which also serves as a lowerelectrode; and a light emitting structure including a secondconductivity type Group III nitride semiconductor layer provided on theconductive support portion, a light emitting layer provided on thesecond conductivity type Group III nitride semiconductor layer, and afirst conductivity type Group III nitride semiconductor layer providedon the light emitting layer, the first conductivity type being differentfrom the second conductivity type. The conductive support portion andthe light emitting structure are sandwiched between a pair ofelectrodes. The light emitting structure has a top view shape of acircle or a 4n-gon (“n” is a positive integer) having rounded corners,and the conductive support portion has a top view larger than anddifferent shape from that of the light emitting structure.

(9) The vertically structured Group III nitride semiconductor LED chipaccording to (7) or (8) above, wherein a length of a straight portion inone side of the 4n-gon having rounded corners: L₁ satisfies thefollowing formula:

L₁≦0.8L₀,

wherein L₀ is a length of one side of the 4n-gon with the corners notbeing rounded.

(10) The vertically structured Group III nitride semiconductor LED chipaccording to any one of (7) to (9) above, wherein a top view shape ofthe conductive support portion is an approximately tetragon or octagonshape which is vertically and horizontally symmetrical.

(11) A vertically structured Group III nitride semiconductor LED chipcomprising: a conductive support portion which also serves as a lowerelectrode; and a light emitting structure including a secondconductivity type Group III nitride semiconductor layer provided on theconductive support portion, a light emitting layer provided on thesecond conductivity type Group III nitride semiconductor layer, and afirst conductivity type Group III nitride semiconductor layer providedon the light emitting layer, the first conductivity type being differentfrom the second conductivity type. The conductive support portion andthe light emitting structure are sandwiched between a pair ofelectrodes. The light emitting structure has a top view shape of acircle or a 4n-gon (“n” is a positive integer) having rounded corners,and part of side surfaces of the conductive support portion has a cutplane and a non-cut plane having a different surface shape from the cutplane.

(12) The vertically structured Group III nitride semiconductor LED chipaccording to (11) above, wherein the non-cut plane of the side surfacesof the conductive support portion extends to the top and the bottom ofthe conductive support portion.

(13) The vertically structured Group III nitride semiconductor LED chipaccording to (11) or (12) above, wherein the conductive support portionhas a tetragonal top view shape as a basic structure, and has recesseson the four sides, the top of each recess being the cut plane.

(14) The vertically structured Group III nitride semiconductor LED chipaccording to (11) or (12) above, wherein the conductive support portionhas an octagonal top view shape as a basic structure, and has cut planesin opposite four sides, and the other opposite four sides are non-cutplanes.

Effect of the Invention

In the present invention, a light emitting structure is formed to have atop view shape of a circle or a 4n-gon having rounded corners (n is apositive integer. In other words, 4n means a multiple of 4), todistribute the stress applied to the light emitting structure. Further,a plurality of through grooves or through holes are formed in aconductive support to perform pseudo isolation between the boundaries onthe conductive support, which define each light emitting structure.Thus, the stress applied to the light emitting structure from theconductive support side is distributed and the stress applied to eachlight emitting structure is reduced, which prevents the light emittingstructure supported by the conductive support from being cracked whendetached from a sapphire substrate at the time of the lift-off.Consequently, incidence of cracks is reduced and high quality verticalLED chips without cracks in the light emitting structure can be providedat a high yield.

In the present invention, a primary isolation of a light emittinglaminate made of a Group III nitride semiconductor on the sapphiresubstrate is performed in accordance with the size of the LED chips tobe formed. Since the conductive support still remains as a wafer evenafter a growth substrate is removed by lift-off, device processing canbe performed in post-processes.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1( a) is a schematic side view of one of typical singulated LEDchips; FIG. 1( b) is a schematic plan view of one of the singulated LEDchips; and FIG. 1( c) is a plan view of a wafer provided with aplurality of light emitting structures before singulation.

FIG. 2 is a photograph showing a state of cracks formed in aconventional light emitting structure.

FIGS. 3( a) to 3(f) schematically illustrate a flow of a method formanufacturing vertical LED chips according to the present invention.

FIG. 4 shows a schematic plan view of a wafer before singulation ofvertical LEDs in accordance with the present invention.

FIG. 5( a) is a schematic plan view of a wafer before singulation ofvertical LED chips in accordance with the present invention, and FIG. 5(b) is a schematic side view of a vertical LED chip after singulationaccording to the present invention. FIG. 5( c) is a photograph of anactual vertical LED chip viewed from above.

FIG. 6( a) is a schematic plan view of a wafer before singulation ofvertical LED chips in accordance with the present invention, and FIG. 6(b) is a schematic side view of a vertical LED chip after singulationaccording to the present invention. FIG. 6( c) is a photograph of anactual vertical LED chip viewed from above.

FIG. 7 is a graph showing the incidence of cracks in light emittingstructures of LED chips in Experimental Examples 1 to 8.

FIG. 8 is a graph showing the incidence of cracks in light emittingstructures of LED chips in Experimental Examples 9 to 14.

FIG. 9 is a graph showing the incidence of cracks in light emittingstructures of LED chips in Experimental Examples 15 to 22.

FIGS. 10( a) to 10(d) are photographs each showing a state of cracksformed in a light emitting structure.

BEST MODE FOR CARRYING OUT THE INVENTION

Next, embodiments of a method for manufacturing vertical LEDs inaccordance with the present invention will be described with referenceto the drawings. FIGS. 3( a) to 3(f) schematically show a flow of amethod for manufacturing vertical LEDs in accordance with the presentinvention. The vertical LEDs in FIGS. 3( a) to 3(f) are enlarged in thethickness direction for the sake of explanation.

A method for manufacturing vertical LEDs in accordance with the presentinvention includes, as shown in FIGS. 3( a) to 3(f), a light emittinglaminate formation step (FIG. 3( a)) of forming a light emittinglaminate 105 by sequentially stacking a first conductivity type GroupIII nitride semiconductor layer 102, a light emitting layer 103, and asecond conductivity type Group III nitride semiconductor layer 104having a different conductivity type from the first conductivity type ona growth substrate 101; a light emitting structure formation step (FIG.3( b)) of forming a plurality of separate light emitting structures 106,for example isolated like islands by partially removing the lightemitting laminate 105 to partially expose the growth substrate 101; astep of forming a conductive support 107 also serving as a lowerelectrode on the plurality of light emitting structures 106 (FIG. 3(c)); a separation step of lifting off the growth substrate 101 from theplurality of light emitting structures 106 (FIG. 3( d)); and a cuttingstep of cutting the conductive support 107 between the light emittingstructures 106 into conductive support portions 107 a (FIG. 3( f)) toperform singulation of a plurality of LED chips 100 each having a lightemitting structure 106. Note that as shown in FIG. 3( e), another stepof forming an upper electrode 108 on the separation side of the lightemitting structure may be added after the separation step.

The present inventors formed a vertical LED 200 including a lightemitting structure having a square top view shape as shown in FIG. 1( b)in order to observe cracks formed in the light emitting structure, tofind many cracks in the light emitting structure 201 as shown in FIG. 2.These cracks are shown to propagate from the vicinity of the corners ofthe light emitting structure 201 to the center part. Note that FIG. 2shows a light emitting structure having a square top view shape of whichone side has a length of 1000 μm, which were observed using an opticalmicroscope. Such cracks propagating to the center part are formedsignificantly in light emitting structures of large size chips having aside of 500 μm or more in length.

The present inventors have made various studies on the formation of suchcracks to ascertain that the cracks are formed depending on the shapesof light emitting structures or conductive support portions rather thandepending on the crystallographic slip planes or cleavage planes. Theyfound that many cracks were formed particularly in the vicinity of thecorners of the light emitting structures. This is considered to beassociated with distribution of stresses, such as the stresses among thegrowth substrate and the light emitting structures and connectedconductive support portions, that concentrate at the vicinity of thecorners in the light emitting structures when the growth substrate isseparated from the light emitting structures.

In view of the above, the light emitting structure formation step (FIG.3( b)) of the method for manufacturing vertical LED chips in accordancewith the present invention includes partially removing the lightemitting laminate 105 so that each of the plurality of light emittingstructures 106 has a top view shape of a circle or a 4n-gon (“n” is apositive integer) having rounded corners as shown in FIG. 4. With such astructure, stress concentration at the light emitting structures 106 isprecluded, and high quality vertical LED chips without cracks can beprovided.

Further, in the conductive support formation step (FIG. 3( c)) of themethod for manufacturing vertical LED chips in accordance with thepresent invention, a portion of the conductive support located betweenthe light emitting structures is provided with a plurality of throughgrooves or through holes which penetrate the conductive support. Thus,the stress applied to each of the light emitting structures from theconductive support side is distributed, and stress concentration at thevicinity of the corners of the light emitting structures 106 is avoided.Therefore, high quality vertical LED chips without cracks can beprovided.

A sapphire substrate or an AlN template substrate in which an AlN filmis formed on a sapphire substrate is preferably used as the growthsubstrate 101. The selection may be made depending on the kind of alift-off layer to be formed, the composition of Al, Ga, and In of thelight emitting laminate made of a Group III nitride semiconductor, thequality of LED chips, cost, and the like.

A GaN buffer layer is preferable as a lift-off layer in cases ofemploying laser lift-off in that it can be thermally decomposed by laserand prevented from reattaching thereafter (since the melting point of Gais low as 29.7° C.), while a metal buffer layer of CrN or the like ispreferable as a lift-off layer in cases of employing chemical lift-offin that it can be dissolved by selective chemical etching. The GaNbuffer layer is preferably formed in an MOCVD apparatus described below,and the metal buffer layer is preferably formed by sputtering, vacuumvapor deposition, ion plating, or MOCVD.

The first conductivity type and the second conductivity type of thelight emitting laminate 105 may be n-type and p-type, respectively oropposite thereto. The first conductivity type Group III nitridesemiconductor layer 102, the light emitting layer 103, and the secondconductivity type Group III nitride semiconductor layer 104 can beepitaxially grown on the growth substrate 101, for example by MOCVD.

The light emitting structures 106 manufactured by a method formanufacturing vertical LED chips in accordance with the presentinvention has a top view shape of a circle or a 4n-gon (“n” is apositive integer) having rounded corners. Therefore, when the conductivesupport 107 is assumed to be cut along orthogonal lines as shown bydashed lines in FIG. 4, the circle or the 4n-gon (“n” is a positiveinteger) having rounded corners can be located symmetrically; thus, theapplied stress can be distributed uniformly. Further, a vertical crosssection of each light emitting structure 106 has rounded corners, whichdistributes the stress applied to the light emitting structures 106 whenthe light emitting structures 106 are separated from the growthsubstrate 101 to be transferred onto the conductive support 107, so thatthe formation of cracks can be further suppressed.

In the above-described light emitting structure formation step, part ofthe light emitting laminate 105 is preferably removed by dry etching.This is because end points of etching of the light emitting laminate 105made of a Group III nitride semiconductor layer can be reproduciblycontrolled. Further, in cases where adjacent light emitting structures106 connect, when the growth substrate 101 is separated, for example bylaser lift-off, there is no escape for nitrogen gas generated by thermaldecomposition of the above GaN layer and the like, which results incracks or rupture in the light emitting structures 106. Further in thatcase, when the above-described chemical lift-off or photochemicallift-off by which the metal buffer layer is dissolved with a chemicaletchant is used, the etchant is not supplied to the metal layer. Thus,lift-off cannot be carried out. Therefore, the removal of part of thelight emitting laminate 105 is performed to expose part of the growthsubstrate 101.

Although not shown in the drawings, in the above support formation step,an ohmic electrode layer and a connection layer are preferably formedbetween the plurality of light emitting structures 106 and theconductive support 107 such that the ohmic electrode layer contacts eachof the plurality of light emitting structures 106 and the connectionlayer contacts the conductive support 107. Further, an additionalreflection layer is more preferably formed between the ohmic electrodelayer and the connection layer; alternatively, the ohmic electrode layerpreferably also serves as a reflection layer. These layers can be formedby a dry film formation method such as vacuum vapor deposition, ionplating, or sputtering.

The foregoing ohmic electrode layer can be formed of a high workfunction metal, for example, a noble metal such as Pd, Pt, Rh, or Au; orCo or Ni.

The above ohmic electrode layer can be used also as a reflection layersince Rh and the like have high reflectivity. However, when the emissionwavelengths are in the range of green to blue, a layer of Ag, Al, or thelike is preferably used. Meanwhile, when the emission wavelengths are inan ultraviolet range, a layer of Rh, Ru, or the like is preferably used.

Further, the kind of the connection layer depends on the forming methodof the conductive support 107. When the conductive support 107 is bondedto the connection layer by a bonding method such as thermocompressionbonding, the connection layer can be made of Au, Au—Sn, solder, or thelike.

Note that the conductive support 107 is preferably a conductive siliconsubstrate, a CuW alloy substrate, a Mo substrate, or the like since theyare suitable in terms of the thermal expansion coefficient and thermalconductivity. Further, the conductive support 107 may be formed by wetor dry plating. For example, Cu or Au electroplating is employed; Cu,Au, or the like can be used as the connection layer.

The conductive support portion 107 a viewed from above preferably has atop view larger than that of the light emitting structure 106, so that50 μm or more of the end portion of the conductive support portion 107 ais exposed. Further, a vertical cross section of the conductive supportportion 107 a preferably has a tetragonal or octagonal shape as a basicstructure. The term “as a basic structure” here means that theconductive support portion after dicing may have depressions orprotrusions on its sides or its corner portions and means that holes orgrooves may be formed in the conductive support 107 before dicing.

More specifically, as shown in examples of FIG. 5( a) and FIG. 6( a), aplurality of through grooves 109 or through holes 110 penetrating theconductive support 107 are preferably provided in a portion of theconductive support 107 located between the light emitting structures106. The holes or grooves are provided in the conductive support, sothat pseudo isolation is performed between the boundaries on theconductive support defining each light emitting structure. Thus, thestress applied to the light emitting structures from the conductivesupport portion side can be alleviated and distributed.

When the metal layer is lifted off by being dissolved by chemicallift-off or photochemical lift-off using a chemical etchant, the etchantcan be supplied and drained effectively by forming the through grooves109 or the through holes 110 in the conductive support 107 in additionto grooves 111 (etch channels) between the light emitting structures106. Thus, the etching rate of the metal layer can be improved, which isa secondary effect.

Note that the through grooves 109 or the through holes 110 in the aboveconductive support 107 are formed by dry etching when a Si substrate isused as the conductive support 107, while the grooves or the holes areformed using a mask of a thick photoresist film when the conductivesupport 107 is made by Cu or Au plating. It is naturally preferable thatthe grooves or the holes and the separation grooves between the lightemitting structures 106 are facing each other. When the through grooves109 or the through holes 110 are positioned under the light emittingstructures 106, stress distribution becomes nonuniform, which wouldpromote crack formation and damage the conductive support portion toimpair heat dissipation.

In the above separation step, the lift-off layer is preferably removedby laser lift-off, chemical lift-off, or photochemical lift-off toperform separation between the growth substrate 101 and the lightemitting structures 106.

Further, surfaces of the light emitting structures 106 that have beenexposed by the separation step are preferably cleaned by wet washing.Then, a given thickness of the surfaces is trimmed by dry etching and/orwet etching, and an n-type ohmic electrode and a bonding pad electrodeare formed by lift-off using a resist as a mask. Al, Cr, Ti, Ni, Pt, Au,or the like is used as an electrode material. Pt, Au, or the like isdeposited as a cover layer on the ohmic electrode and the bonding pad toreduce wiring resistance and improve adhesion of the wire bonding. Notethat the side surfaces and surfaces of the light emitting structures 106may be provided with a protective film made of SiO₂, SiN, or the like.

In the above cutting step, cutting is performed between the lightemitting structures 106 using, for example, a dicing blade or a laserdicer. In order to prevent heat or crushing damage on the light emittingstructures 106, the light emitting structures 106 are generally putinside the periphery of each conductive support portion 107 a, with atypical margin of about 10 μm to 30 μm.

Further, the cutting step is preferably performed along through theplurality of through grooves 109 or through holes 110. In other words,with respect to vertical LEDs of the present invention, at least one ofa plurality of side surfaces of the conductive support portion can bepart of a wall of the through groove 109 or the through hole 110 bymeans of the above-described method for manufacturing vertical LEDs.FIG. 5( b) and FIG. 6( b) each show a schematic side view of verticalLEDs after the cutting step. The hatching in the conductive supportportion 107 shows a cut portion and the rest shows part of the walls ofthe above through grooves 109 or through holes 110.

That is to say, the division plane after dicing constitutes part of theconductive support portion, and part of side surfaces of the conductivesupport portion in a chip preferably have a non-cut plane which is not acut plane. Here, the “cut plane” refers to a plane along which cuttingis directly performed using a dicer or the like in the cutting step. Forexample, when the conductive support 107 is cut along through the abovethrough grooves or through holes, planes corresponding to the walls ofthese through grooves or through holes are non-cut planes which have notbeen touched by a blade or exposed to laser. Therefore, such non-cutplanes and the above mentioned cut planes have different surface shapeseach other.

The cut planes are blade-cut planes or laser-melted planes. The non-cutplanes are dry etched planes or planes left after removing resist masks.The non-cut planes would be subjected to an etchant, for example, inchemical lift-off or in the formation of the electrodes. Although thedifference of surface conditions between the cut planes and the non-cutplanes is difficult to define with roughness and the like but can beobserved using an optical microscope or the like.

Next, embodiments of vertical LEDs in accordance with the presentinvention will be described with reference to the drawings.

Vertical LEDs in accordance with the present invention, as an exampleshown in FIG. 4, comprises a conductive support portion 107 a and alight emitting structure 106 including a second conductivity type GroupIII nitride semiconductor layer provided on the conductive supportportion 107 a, a light emitting layer provided on the secondconductivity type Group III nitride semiconductor layer, and a firstconductivity type Group III nitride semiconductor layer provided on thelight emitting layer, the first conductivity type being different fromthe second conductivity type. The conductive support portion 107 a andthe light emitting structure 106 are sandwiched between a pair ofelectrodes. Further, the light emitting structure 106 has a top view ofa circle or a 4n-gon (“n” is a positive integer) having rounded corners,and the conductive support portion 107 a has a top view larger than anddifferent shape from that of the light emitting structure 106. With sucha structure, high quality vertical LEDs with less cracks in the lightemitting structures 106 can be provided.

Note that the drawings and the following description are based on acircle or a regular 4n-gon, which has equal height and width forconvenience; however, similar effects can be achieved even if the heightand the width have different lengths. In cases of using an ellipse, arectangle, or the like, the height and the width should satisfy theconditions below without exceeding the aspect ratio of 3:1.

The length of a straight portion in one side of the 4n-gon havingrounded corners L₁ preferably satisfies the following formula:

L₁≦0.8L₀,

wherein L₀ is a length of one side of the 4n-gon with the coroners notbeing rounded.

Here, the rounded corners in the present invention are preferablycircular arcs having a curvature radius of R. The lower limit of Rrequired for suppressing cracks depends on the chip size or thestructures of the growth substrate, the buffer layer, the light emittingstructures, and the conductive support portions of the LEDs. In thepresent invention, the corners are rounded by design so that therounding exceeds the roundness range formed by the general bevelingamount on a photomask or the bluntness caused at the corner portions ina photolithography process.

In a case where an n-gon is inscribed in a square having a side lengthof W, when the length L₀ of the side of the polygon is as follows:

L ₀ =W×tan(180°/N).

When the circular arc of a rounded corner having a curvature radius of Ris inscribed to the sides meeting at a corner of the n-gon, the lengthof a side after beveling (straight portion) L₁ is as follows:

L ₁ =L ₀−2×R/tan ((180°−360°/N)/2).

The ratio of L₁ to L₀:L₁/L₀ is as follows:

$\begin{matrix}{{L_{1}/L_{0}} = {1 - {2 \times {{{R/W}/{\tan \left( {\left( {{180{^\circ}} - {360{{^\circ}/N}}} \right)/2} \right)}}/{\tan \left( {180{{^\circ}/N}} \right)}}}}} \\{= {1 - {2 \times {{{R/W}/{\tan \left( {{90{^\circ}} - {180{{^\circ}/N}}} \right)}}/{\tan \left( {180{{^\circ}/N}} \right)}}}}} \\{= {1 - {2 \times {R/{W.}}}}}\end{matrix}$

Thus, the ratio depends on W and R, and is not dependent on N.

In the present invention, the ratio of length L₀ of one side the polygonbefore beveling to the length L₁ of the straight portion in a side afterbeveling: L₁/L₀ is preferably 0.8 or less, more preferably 0.7 or less,so that crack formation can be significantly suppressed.

Further, a top view of the conductive support portion 107 a ispreferably larger than that of the light emitting structure 106, and 50μm or more of the end portion of the conductive support portion 107 a ispreferably exposed. Furthermore, the top view shape of the conductivesupport portion 107 a preferably has a tetragonal or octagonal shape asa basic structure. The term “as a basic structure” here means that theconductive support portion 107 a after the cutting step may havedepressions or protrusions on its sides or its corner portions and meansthat the through grooves 109 or the through holes 110 may be formed inthe conductive support 107 before the cutting step. The through groove109 or the through holes 110 are provided in the conductive support 107,so that the through groove 109 or the through holes 110 in theconductive support 107 alleviate the stress applied to the lightemitting structures, which contributes to the prevention of crackformation.

Note that FIGS. 1 to 6 show examples of alternative embodiments, and thepresent invention is not limited to these embodiments.

EXAMPLE Experimental Examples 1 to 8

In Experimental Examples 1 to 8, a lift-off layer (CrN layer, thickness:18 nm) was formed on a sapphire substrate, and then an n-type Group HInitride semiconductor layer (GaN layer, thickness: 7 μm), a lightemitting layer (InGaN-based MQW layer, thickness: 0.1 μm), and a p-typeGroup HI nitride semiconductor layer (GaN layer, thickness: 0.2 μm) weresequentially stacked to form a light emitting laminate. Subsequently,the light emitting laminate was partially removed to partially exposethe sapphire substrate. Thus, a plurality of light emitting structuresisolated like islands were formed such that the light emittingstructures have a vertical cross section of a square, a square havingrounded corners, or a circle. Table 1 shows the length L₀ of a side ofthe square before rounding the corners, the curvature radius R, thelength L₁ of a straight portion in a side after the rounding, and theratio of L₁ to L₀:L₁/L₀.

TABLE 1 Incidence of Incidence Through cracks from of cracks grooves/the corners along the Vertical cross-sectional shape W R L₀ L₁ L₁/Through toward the corners of the Light emitting structures (μm) (μm)(μm) (μm) L₀ Support holes center (%) (%) Experimental Example 1 Square850 — 850 850 1.00 Si None 92.3 0 Experimental Example 2 Approximatelysquare  10 830 0.98 substrate 83.2 0 Experimental Example 3  50 750 0.88Thermal 68.3 16.3 Experimental Example 4 100 650 0.77 com- 22.4 49.3Experimental Example 5 150 550 0.65 pression 0 57.3 Experimental Example6 250 350 0.41 bonding 0 8.9 Experimental Example 7 350 150 0.18 0 2.3Experimental Example 8 Circle 425 0 0 0 2.0 Experimental Example 9Regular octagon — 352 352 1.00 43.5 5.0 Experimental Example 10Approximately  10 345 0.98 28.3 18.5 Experimental Example 11 regularoctagon 100 271 0.77 8.8 25.2 Experimental Example 12 150 229 0.65 0 6.3Experimental Example 13 250 144 0.41 0 2.4 Experimental Example 14Circle 425 0 0 0 2.0 Experimental Example 15 Regular dodecagon — 228 2281.00 19.7 2.0 Experimental Example 16 Approximately regular dodecagon 10 223 0.98 15.3 3.3 Experimental Example 17 Approximately regulardodecagon  50 201 0.88 5.8 10.8 Experimental Example 18 Approximatelyregular dodecagon 100 173 0.76 0 15.1 Experimental Example 19Approximately regular dodecagon 150 148 0.65 0 4.8 Experimental Example20 Approximately regular dodecagon 250 93 0.41 0 3.2 ExperimentalExample 21 Approximately regular dodecagon 350 41 0.18 0 2.1Experimental Example 22 Circle 425 0 0 0 2.0 Conventional Example Square1000 — 1000 1000 1.00 Cu 95.5 0 Experimental Example 23 Circle 500 0 0Plating 23.1 0 Experimental Example 24 Circle 500 0 0 Through 2 0grooves Experimental Example 25 Circle 500 0 0 Through 5.3 0 holes

An ohmic electrode layer (Rh, thickness: 0.1 μm) and a connection layer(Au—Sn alloy, thickness: 1.5 μm) were formed on the light emittingstructures. Ohmic contacts of Ti/Pt were formed on both surfaces of aboron-doped p-type conductive silicon substrate to be bonded to thelight emitting structures. Further, another connection layer (Au-Snalloy layer, thickness: 1.0 μm) was formed on the silicon substrate onthe side to be bonded to the above light emitting structures. Then thebonding was performed by hot press.

After that, the sapphire substrate was separated by chemical lift-off.Note that diammonium cerium(IV) nitrate solution was used as an etchant.This solution is suitable because it can etch only the lift-off layerwithout corroding the silicon substrate and the above metal layers.

Experimental Examples 9 to 14

The sapphire substrate was separated by a similar method to the aboveExperimental Examples except for that the light emitting laminate waspartially removed to form a plurality of light emitting structuresisolated like islands such that the light emitting structures have avertical cross-sectional shape of a regular octagon, a regular octagonhaving rounded corners, or a circle.

Experimental Examples 15 to 22

The sapphire substrate was separated by a similar method to the aboveExperimental Examples except for that the light emitting laminate waspartially removed to form a plurality of light emitting structuresisolated like islands such that the light emitting structures have avertical cross-sectional shape of a regular dodecagon, a regulardodecagon having rounded corners, or a circle.

Conventional Example and Experimental Examples 23 to 25

A light emitting laminate was partially removed to form a plurality oflight emitting structures isolated like islands such that the lightemitting structures have a vertical cross-sectional shape of a square(Conventional Example) or a circle. The width W of the light emittingstructures was 1000 μm. Table 1 shows the length L₀ of a side of thesquare before rounding the corners, the curvature radius R, the lengthL₁ of a straight portion in a side after the rounding, and the ratio ofL₁ to L₀:L₁/L₀. The devices were individually disposed inside the cellsin a grid. The pitch between the devices is 1250 μm.

In Experimental Examples 24 and 25, an ohmic electrode layer (NiO andAg) was formed on the p-layers of each light emitting structure. Then,photoresists were embedded in the division grooves while a p-ohmicelectrode layer portion of each light emitting structure was opened, anda connection layer (Ni/Au/Cu) was formed. Next, pillars were formedusing thick film resists in order to prevent film formation at the timeof Cu plating to be described later. The pillars are formed on the gridlines surrounding each light emitting structure as shown in FIG. 5( a)or at the points where the lines intersect as shown in FIG. 6( a). Notethat portions of the connection layer on the pillar formation areas werepreviously removed by etching.

Next, electroplating with Cu was performed using a copper sulfate-basedelectrolyte solution to form a 80 μm conductive support. The solutiontemperature was in the range of 25° C. to 30° C., and the depositionrate was 25 μm/hr. Then, the pillar portions and the resists embedded inthe division grooves were removed by chemical cleaning, and grooves orholes penetrating the conductive support were formed. Note that thethrough grooves 109 shown in FIG. 5( a) were formed to have four sideswith a width of 70 μm and a length of 900 μm. The through holes 110shown in FIG. 6( a) were each shaped into a rectangular prism having alength of 410 μm on a side. After that, the metal layer was dissolvedand removed using a selective etchant to separate the growth sapphiresubstrate, and the light emitting structures were transferred to theconductive support. Note that in Conventional Example and ExperimentalExample 23, Cu plating was performed on the entire surface withoutforming additional pillars and without removing the connection layer onthe pillar portions.

(Evaluation)

In Experimental Examples 1 to 22, the surfaces of the light emittingstructures exposed by separating the sapphire substrate from the lightemitting structures were observed using an optical microscope, toexamine the state of crack formation and crack incidence in the wafersurface. The state where cracks propagated from the corner portions tothe chip center as shown in FIG. 10( a) and the state where cracks wereformed in the vicinity of the corner portions as shown in FIG. 10( b)were specific features, and no cracks were formed on straight portionsin the sides. The incidence of the cracks from the corner portions tothe chip center and the cracks in the vicinity of the corner portionsare shown in Table 1 and FIGS. 7 to 9. Note that FIG. 7 shows theresults of Experimental Examples 1 to 8, FIG. 8 show the results ofExperimental Examples 9 to 14, and FIG. 9 shows the results ofExperimental Examples 15 to 22.

As shown in Table 1 and FIGS. 7 to 9, in Experimental Examples 2 to 8,10 to 14, and 16 to 22 in accordance with the present invention, atleast either the cracks from the corners toward the center or the cracksalong the corners can be suppressed as compared with ExperimentalExamples 1, 9, and 15 that are comparative examples.

Further, also in Conventional Example and Experimental Examples 23 to25, the surfaces of light emitting structures exposed by separating thesapphire substrate were observed using an optical microscope, to examinethe state of crack formation and crack incidence in the wafer surface.The incidence of the cracks from the corner portions to the chip centerand the cracks in the vicinity of the corner portions are also shown inTable 1

The above results show that when the through grooves or the throughholes penetrating the conductive support are provided in a portion ofthe conductive support located between the plurality of light emittingstructures, the stress applied to the light emitting structures from theconductive support in the separation of the sapphire substrate wasdistributed. Further, with respect to the samples in ExperimentalExamples 23 to 25, the time required for etching the metal layer was 35hours when the through grooves or holes were not provided. On the otherhand, when the through grooves or holes were formed, the time was 6hours in both cases; thus, not only suppression of crack formation butalso great effect in improving productivity was found.

Next, the light emitting structures exposed by separating the sapphiresubstrate were cleaned. Ti/Al/Ni/Au were formed by vacuum vapordeposition as an n-type ohmic electrode and a wire bonding padelectrode, and the light emitting structures were singulated by cuttingusing a laser dicer along the cut position shown by the dashed lines inFIG. 5( a) and FIG. 6( a). The kerf loss was 11 μm to 18 μm. In a caseof using a dicing blade, the cutting feed rate cannot be varied at thepositions of the through grooves or holes. On the other hand, in thecase of using the laser dicer, the penetrating portions which are notrequired to be cut can be skipped; accordingly, the cutting time wasreduced by 50% in the case of forming the through holes at intersectionpoints, and by 60% in the case of forming the through grooves on thegrid lines.

Thus, the conductive support portions of LED chips include uncutportions in their side surfaces as shown in the side view of FIG. 5( b).The conductive support portion after singulation has a tetragonal topview shape as a basic shape as shown in FIG. 5( c). FIG. 6 shows thecase of forming the through holes at the intersection points, and thecorner portions of the square support substrates are chipped, and theshape of the through holes may be a circular cylinder or a polygonalprism. The top view shape of the conductive support after singulation isan octagon as a basic structure as shown in FIG. 6( c). In this case,the light emitting structures also have cut portions and uncut portionsin their side surfaces as shown in FIG. 6( b). Further, the top viewshape of those light emitting structures and the top view shape of thoseconductive support portions are different, and this structure ispreferable in that end faces of the conductive support portions aregreater than those of the light emitting structures.

Therefore, as shown in Table 1 and FIGS. 7 to 9, in Experimental Example2 to 8, 10 to 14, 16 to 22, 24, and 25 in accordance with the presentinvention, either cracks from the corners toward the center or cracksalong the corners can be effectively prevented from forming, as comparedwith Conventional Example and Experimental Examples 1, 9, 15, and 23that are comparative examples.

As described above, Experimental Examples 2 to 8, 10 to 14, 16 to 22,24, and 25 show examples of vertical cross sections of 4n-gons havingrounded corners when “n”=1, 2, 3. When “n” is 4 or more, theintersection angle increases. Besides, as the corners are rounded more,the 4n-gon gradually approximates to a circle and can be consideredsubstantially as a circle.

INDUSTRIAL APPLICABILITY

According to the present invention, light emitting structures are formedto have a top view shape of a circle or a 4n-gon (“n” is a positiveinteger) having rounded corners, and grooves or through holes areprovided in a conductive support between a plurality of light emittingstructures. Therefore, the stress applied to the light emittingstructures from conductive support portions in separation of a sapphiresubstrate is distributed; thus, high quality vertical LED chips withgood yield without cracks in the light emitting structures can beprovided.

EXPLANATION OF REFERENCE NUMERALS

-   100: Vertical LED chip-   101: Growth substrate-   102: First conductivity type Group III nitride semiconductor layer-   103: Light emitting layer-   104: Second conductivity type Group III nitride semiconductor layer-   105: Light emitting laminate-   106: Light emitting structure-   107: Conductive support also serving as lower electrode-   107 a: Conductive support portion-   108: Upper electrode-   109: Through groove-   110: Through hole-   111: Groove (etch channel)-   200: Vertical LED chip-   201: Light emitting structure-   202: Conductive support also serving as lower electrode-   203: Upper electrode

1. A method for manufacturing vertically structured Group III nitridesemiconductor LED chips, comprising: a light emitting laminate formationstep of forming a light emitting laminate by sequentially stacking afirst conductivity type Group III nitride semiconductor layer, a lightemitting layer, and a second conductivity type Group III nitridesemiconductor layer on a growth substrate, the second conductivity typebeing different from the first conductivity type; a light emittingstructure formation step of forming a plurality of separate lightemitting structures by partially removing the light emitting laminate topartially expose the growth substrate; a step of forming an ohmicelectrode layer and a connection layer on the plurality of lightemitting structures; a step of forming a conductive support which alsoserves as a lower electrode on the connection layer; a separation stepof lifting off the growth substrate from the plurality of light emittingstructures; and a cutting step of cutting the conductive support betweenthe light emitting structures thereby singulating a plurality of LEDchips each having the light emitting structure supported by a conductivesupport portion, wherein the light emitting structure formation stepincludes a step of partially removing the light emitting laminate suchthat each of the plurality of light emitting structures has a top viewshape of a circle or a 4n-gon (“n” is a positive integer) having roundedcorners.
 2. The method for manufacturing vertically structured Group IIInitride semiconductor LED chips according to claim 1, wherein aplurality of through grooves or through holes penetrating the conductivesupport are provided in a portion of the conductive support locatedbetween the light emitting structures.
 3. The method for manufacturingvertically structured Group III nitride semiconductor LED chipsaccording to claim 2, wherein the cutting step is performed alongthrough the plurality of through grooves or through holes.
 4. The methodfor manufacturing vertically structured Group III nitride semiconductorLED chips according to claim 1, wherein the separation step is performedby chemical lift-off or photochemical lift-off.
 5. The method formanufacturing vertically structured Group III nitride semiconductor LEDchips according to claim 1, wherein the separation step is performed bylaser lift-off.
 6. The method for manufacturing vertically structuredGroup III nitride semiconductor LED chips according to claim 1, whereinthe step of forming the conductive support is performed by a bondingmethod, a wet film formation method, or a dry film formation method. 7.A vertically structured Group III nitride semiconductor LED chipmanufactured by the method according to claim 1, wherein at least one ofa plurality of side surfaces of the conductive support portion is partof a wall of the through groove or the through hole.
 8. A verticallystructured Group III nitride semiconductor LED chip comprising: aconductive support portion which also serves as a lower electrode; and alight emitting structure including a second conductivity type Group IIInitride semiconductor layer provided on the conductive support portion,a light emitting layer provided on the second conductivity type GroupIII nitride semiconductor layer, and a first conductivity type Group IIInitride semiconductor layer provided on the light emitting layer, thefirst conductivity type being different from the second conductivitytype, wherein the conductive support portion and the light emittingstructure are sandwiched between a pair of electrodes, the lightemitting structure has a top view shape of a circle or a 4n-gon (“n” isa positive integer) having rounded corners, and the conductive supportportion has a top view larger than and different shape from that of thelight emitting structure.
 9. The vertically structured Group III nitridesemiconductor LED chip according to claim 7, wherein a length of astraight portion in one side of the 4n-gon having rounded corners: L₁satisfies the following formula:L₁≦0.8L₀, wherein L₀ is a length of one side of the 4n-gon with thecorners not being rounded.
 10. The vertically structured Group IIInitride semiconductor LED chip according to claim 7, wherein a top viewshape of the conductive support portion is an approximately tetragon oroctagon shape which is vertically and horizontally symmetrical.
 11. Avertically structured Group III nitride semiconductor LED chipcomprising: a conductive support portion which also serves as a lowerelectrode; and a light emitting structure including a secondconductivity type Group III nitride semiconductor layer provided on theconductive support portion, a light emitting layer provided on thesecond conductivity type Group III nitride semiconductor layer, and afirst conductivity type Group III nitride semiconductor layer providedon the light emitting layer, the first conductivity type being differentfrom the second conductivity type, wherein the conductive supportportion and the light emitting structure are sandwiched between a pairof electrodes, the light emitting structure has a top view shape of acircle or a 4n-gon (“n” is a positive integer) having rounded corners,and part of side surfaces of the conductive support portion has a Gutplane and a non-cut plane having a different surface shape from the cutplane.
 12. The vertically structured Group III nitride semiconductor LEDchip according to claim 11, wherein the non-cut plane of the sidesurfaces of the conductive support portion extends to the top and thebottom of the conductive support portion.
 13. The vertically structuredGroup III nitride semiconductor LED chip according to claim 11, whereinthe conductive support portion has a tetragonal top view shape as abasic structure, and has recesses on the four sides, the top of eachrecess being the cut plane.
 14. The vertically structured Group IIInitride semiconductor LED chip according to claim 11, wherein theconductive support portion has an octagonal top view shape as a basicstructure, and has cut planes in opposite four sides, and the otheropposite four sides are non-cut planes.